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In the production lines of semiconductor fabs, abnormalities should be quickly detected to avoid yield loss.
To meet this need, DI4600 is designed to detect defects on patterned wafers with high sensitivity and throughput. High sensitivity and throughput are realized by the combination of the sheet-beam optics and the accurate light separation with spatial filters.
DI4600 systems are installed and running as in-line defect management tools in the cutting-edge memory and logic semiconductor fabs.
(1) Bacteria, 7 kV, magnification 20,000x; (2) Pharmaceutics, magnification 7,500x; (3) Paper, low-vacuum, 2,700x
(1) Bacteria, 7 kV, magnification 20,000x; (2) Pharmaceutics, magnification 7,500x; (3) Paper, low-vacuum, 2,700x
(1) Bacteria, 7 kV, magnification 20,000x; (2) Pharmaceutics, magnification 7,500x; (3) Paper, low-vacuum, 2,700x
(1) Bacteria, 7 kV, magnification 20,000x; (2) Pharmaceutics, magnification 7,500x; (3) Paper, low-vacuum, 2,700x
