CG7300 CD-SEM

CG7300 For the EUV era device production – High Reliability CD-SEM

The Advanced CD Measurement SEM CG7300 (HITACHI CD-SEM) will offer higher resolution with a fully renewed electron optical system along with improved metrology repeatability and image quality. The electron microscope column is able to select secondary electrons and backscattered electrons emitted from the material depending on the measurement target. In this way, CD-SEM: CG7300 is able to measure the bottom dimensions of deep trenches and holes in via-in-trench BEOL process as well as 3D NAND and DRAM.

• Realized a wide variety of enhanced and reliable metrology for semiconductor mass production in the EUV Lithography era.
• Achieved high reliable process control by minimizing machine differences error down to the atomic size level. (Improved to enhance tool-to-tool matching performance by around 10% compared to the previous model.)
• Clear and high-resolution images are realized by improving environmental resistance and anti-charging high-speed scanning.
• Applicable to a wide range of metrology needs from high-precision CD to CD Uniformity by improved scanning performance.
• Contributes to productivity and CoO (Cost of Owner ship) improvement by increasing throughput and improving Edge Exclusion

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