UVD - CL Detector
UVD - CL Detector
UVD - CL Detector
UVD - CL Detector
UVD - CL Detector
UVD - CL Detector

UVD - CL Detector

In the variable pressure SEM, positive charges generated by collisions between incident electrons and residual gas molecules inside the chamber act to neutralize the negative charge on the specimen surface. Hitachi has developed an ultra variable-pressure detector (UVD), which can detect the charge cascade under low-vacuum conditions . In addition to this SE detector functionality, the detector can also be used for CL observation of materials.

In order to efficiently detect SEs generated from the specimen when it is irradiated by an electron beam under a low vacuum, a bias voltage is applied to the detector front edge. This forms an electric field between the detector and the specimen, which accelerates the SEs generated at the specimen surface. The SEs then collide with the residual gas molecules in the low-vacuum environment, ionizing the molecules into positive ions and electrons while simultaneously generating light. By detecting this light using the UVD during the beam scanning, images that reflect topological information about the specimen surface can be captured.
Figure 1b) shows the results of observation of a fracture surface of carbon fiber reinforced plastic (CFRP) using a UVD mounted on a model SU3800 tungsten SEM (W-SEM) system. The detailed surface roughness of the resin fracture surface and the state of the resin around the carbon fibers could be observed in the low-vacuum condition while suppressing charging. In order to respond to a wide range of needs, Hitachi have been able to provide the UVD in a range of microscopes from a W-SEM system equipped with a thermal electron gun to a field emission SEM (FE-SEM) system equipped with a Schottky electron gun.

Ultra Variable-pressure Detector (UVD)

Figure 1(a) shows a schematic diagram of the UVD. In order to efficiently detect SEs generated from the specimen when it is irradiated by an electron beam under a low vacuum, a bias voltage is applied to the detector front edge. This forms an electric field between the detector and the specimen, which accelerates the SEs generated at the specimen surface. The SEs then collide with the residual gas molecules in the low-vacuum environment, ionizing the molecules into positive ions and electrons while simultaneously generating light. By detecting this light using the UVD during the beam scanning, images that reflect topological information about the specimen surface can be captured.
Figure 1(b) shows the results of observation of a fracture surface of carbon fiber reinforced plastic (CFRP) using a UVD mounted on a model SU3800 tungsten SEM (W-SEM) system. The detailed surface roughness of the resin fracture surface and the state of the resin around the carbon fibers could be observed in the low-vacuum condition while suppressing charging. In order to respond to a wide range of needs, Hitachi have been able to provide the UVD in a range of microscopes from a W-SEM system equipped with a thermal electron gun to a field emission SEM (FE-SEM) system equipped with a Schottky electron gun.

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