{"title":"Failure Analysis","description":"\u003cp\u003e\u003ca name=\"_Toc90986252\"\u003e\u003c\/a\u003eFailure analysis requires the ability to locate, expose, image and understand the root cause of device or process failure. Spectral supports workflows for defect review, delayering, cross-sectioning, electrical probing, microanalysis and surface analysis, helping customers investigate leakage, opens, shorts, contamination, delamination and process-related defects.\u003cbr\u003e\u003c\/p\u003e","products":[{"product_id":"su8600","title":"SU8600 FE-SEM","description":"\u003cdiv class=\"TabContentsArea\"\u003e\n\u003ch1\u003eUltrahigh-Resolution Scanning Electron Microscope SU8600\u003c\/h1\u003e\n\u003ch2\u003e\u003cspan\u003eFeatures\u003c\/span\u003e\u003c\/h2\u003e\n\u003ch3\u003eUltraHigh-Resolution\u003c\/h3\u003e\n\u003cp class=\"TextStyle1\"\u003eHitachi’s high-brightness cold field emission source provides ultrahigh-resolution images even at Ultra-low voltages.\u003c\/p\u003e\n\u003cdiv class=\"ColumnSet\"\u003e\n\u003cdiv class=\"Column1andHalf FirstItem\"\u003e\n\u003cp class=\"ImgOnlyStyle LeftAdjust\"\u003e\u003cimg alt=\"\" src=\"https:\/\/www.hitachi-hightech.com\/image\/global\/science\/products\/microscopes\/electron-microscope\/fe-sem\/su8600_01.png\" width=\"353\"\u003e\u003c\/p\u003e\n\u003c\/div\u003e\n\u003c!--\/Column1andHalf--\u003e\n\u003cdiv class=\"Column1andHalf LastItem\"\u003e\n\u003cp class=\"ImgOnlyStyle RightAdjust\"\u003e\u003cimg alt=\"\" src=\"https:\/\/www.hitachi-hightech.com\/image\/global\/science\/products\/microscopes\/electron-microscope\/fe-sem\/su8600_02.png\" width=\"353\"\u003e\u003c\/p\u003e\n\u003c\/div\u003e\n\u003c!--\/Column1andHalf--\u003e\n\u003c\/div\u003e\n\u003c!--\/ColumnSet--\u003e\n\u003cp class=\"TextStyle4 RightAdjust\"\u003eSpecimen courtesy of Dr. Yoshihiro Kamimura, \u003cbr\u003e National Institute of Advanced Industrial Science and\u003cbr\u003e Technology (AIST), Japan\u003c\/p\u003e\n\u003cp class=\"TextStyle1\"\u003eLeft: RHO-type Zeolite particle at low-kV. In order to reveal fine steps structure on surface, the image was acquired at 0.8 kV of landing voltage. This allows the very fine structure of surface steps to be clearly visible (image on right).\u003c\/p\u003e\n\u003ch3\u003eA Smart Detection System for Low Voltage BSE Imaging\u003c\/h3\u003e\n\u003cdiv class=\"ColumnSet\"\u003e\n\u003cdiv class=\"Column1andHalf FirstItem\"\u003e\n\u003cp class=\"TextStyle1\"\u003eCross section image of 3D NAND;\u003cbr\u003eOxide layer and Nitride layer of capacitor are easily distinguishable in the image due to BSE detection capability.\u003c\/p\u003e\n\u003c\/div\u003e\n\u003c!--\/Column1andHalf--\u003e\n\u003cdiv class=\"Column1andHalf LastItem\"\u003e\n\u003cp class=\"ImgOnlyStyle\"\u003e\u003cimg alt=\"\" src=\"https:\/\/www.hitachi-hightech.com\/image\/global\/science\/products\/microscopes\/electron-microscope\/fe-sem\/su8600_03.png\" width=\"353\"\u003e\u003cbr\u003e Cross Section of 3D NAND (Acceleration Voltage: 1.5 kV)\u003c\/p\u003e\n\u003c\/div\u003e\n\u003c!--\/Column1andHalf--\u003e\n\u003c\/div\u003e\n\u003c!--\/ColumnSet--\u003e\n\u003ch3\u003eFast BSE Imaging : New Out-Column Crystal Type BSED (OCD)\u003c\/h3\u003e\n\u003cdiv class=\"ColumnSet\"\u003e\n\u003cdiv class=\"Column1andHalf FirstItem\"\u003e\n\u003cp class=\"TextStyle1\"\u003eBy using new Out-Column Crystal Type BSED (OCD)*, image acquisition time was less than ONE SECOND, yet lower layer interconnect and Fin FET structure of SRAM are clearly visible.\u003c\/p\u003e\n\u003c\/div\u003e\n\u003c!--\/Column1andHalf--\u003e\n\u003cdiv class=\"Column1andHalf LastItem\"\u003e\n\u003cp class=\"ImgOnlyStyle\"\u003e\u003cimg alt=\"\" src=\"https:\/\/www.hitachi-hightech.com\/image\/global\/science\/products\/microscopes\/electron-microscope\/fe-sem\/su8600_04.png\" width=\"353\"\u003e\u003cbr\u003e Lower Layer Interconnect of 5 nm process SRAM (Acceleration Voltage: 30 kV, Acquisition time \u0026lt;1 second)\u003c\/p\u003e\n\u003cp class=\"TextStyle4 RightAdjust\"\u003e* Option\u003c\/p\u003e\n\u003c\/div\u003e\n\u003c!--\/Column1andHalf--\u003e\n\u003c\/div\u003e\n\u003c!--\/ColumnSet--\u003e\n\u003ch3\u003eEnhanced User Experience with Advanced Automation\u003c\/h3\u003e\n\u003cp class=\"ImgOnlyStyle\"\u003eThe “EM Flow Creator“ software option allows users to configure repeatable SEM operation sequences.\u003cbr\u003eVarious SEM functions can be assembled in the EM Flow Creator’s window by a drag-and-drop method and then saved as a recipe for later use.\u003cbr\u003eOnce a recipe is configured, automated data collection under the set conditions can be performed with high accuracy and repeatability.\u003c\/p\u003e\n\u003cp class=\"ImgOnlyStyle CenterAdjust\"\u003e\u003cimg alt=\"\" src=\"https:\/\/www.hitachi-hightech.com\/image\/global\/science\/products\/microscopes\/electron-microscope\/fe-sem\/su8600_05.png\" width=\"353\"\u003e\u003c\/p\u003e\n\u003ch3\u003eFlexible Interface\u003c\/h3\u003e\n\u003cp class=\"TextStyle1\"\u003eDual monitor configuration supports a flexible and highly efficient workspace. Display and save 6 signals simultaneously in order to acquire more information in less time.\u003c\/p\u003e\n\u003cp class=\"ImgOnlyStyle\"\u003e\u003cimg alt=\"\" src=\"https:\/\/www.hitachi-hightech.com\/image\/global\/science\/products\/microscopes\/electron-microscope\/fe-sem\/su8600_06.png\" width=\"720\"\u003e\u003c\/p\u003e\n\u003cp class=\"TextStyle1\"\u003e1, 2, 4 or 6 signals, including the chamber scope(*) or SEM MAP, can be displayed simultaneously on a single monitor. By adding a second screen, the dual-monitor configuration supports enhanced productivity plus expanded workspace and allows the operation panel to be customized with submenus positioned anywhere on either screen.\u003c\/p\u003e\n\u003c\/div\u003e","brand":"Hitachi High-Tech","offers":[{"title":"Default Title","offer_id":42502665109744,"sku":"459-0088","price":1.0,"currency_code":"SEK","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0629\/5794\/5072\/products\/SU8600fromleftlowressquare.png?v=1648312314"},{"product_id":"su7000","title":"SU7000 FE-SEM","description":"\u003cdiv class=\"page-content\" id=\"ctl00_cphBody_divText\"\u003e\n\u003ch1\u003eUltra-High-Resolution Schottky Scanning Electron Microscope SU7000\u003c\/h1\u003e\n\u003cp\u003eThe SU7000 is the ultimate high-performance all-rounder: an ultra high resolution Schottky FESEM offering nanoscale imaging and powerful analysis\u003c\/p\u003e\n\u003cp align=\"center\"\u003e\u003cimg sizes=\"(min-width: 1200px) 673px, (min-width: 1090px) 667px, (min-width: 992px) calc(66.6vw - 60px), (min-width: 787px) 747px, (min-width: 480px) calc(100vw - 40px), calc(100vw - 30px)\" srcset=\"https:\/\/d12oja0ew7x0i8.cloudfront.net\/image-handler\/ts\/20200219045235\/ri\/747\/src\/images\/equipments\/EquipmentImage_7250_15821059527286795.png 747w, https:\/\/d12oja0ew7x0i8.cloudfront.net\/image-handler\/ts\/20200219045235\/ri\/650\/src\/images\/equipments\/EquipmentImage_7250_15821059527286795.png 650w, https:\/\/d12oja0ew7x0i8.cloudfront.net\/image-handler\/ts\/20200219045235\/ri\/450\/src\/images\/equipments\/EquipmentImage_7250_15821059527286795.png 450w\" src=\"https:\/\/d12oja0ew7x0i8.cloudfront.net\/images\/equipments\/EquipmentImage_7250_15821059527286795.png\" alt=\"(1) Upper detector (UD): microstructure, potential contrasts; (2) Middle detector (MD): high-resolution material contrast; (3) Lower (chamber) detector (LD): topography.\" width=\"747\" height=\"393\"\u003e\u003c\/p\u003e\n\u003cp align=\"center\"\u003e\u003cspan style=\"color: #999999;\"\u003e\u003cem\u003e(1) Upper detector (UD): microstructure, potential contrasts; (2) Middle detector (MD): high-resolution material contrast; (3) Lower (chamber) detector (LD): topography.\u003c\/em\u003e\u003c\/span\u003e\u003c\/p\u003e\n\u003ch3\u003eAdvanced imaging and analysis combined\u003c\/h3\u003e\n\u003cdiv style=\"margin-left: .19in;\"\u003e• Sub-nanometer resolution even below 1kV\u003c\/div\u003e\n\u003cdiv style=\"margin-left: .19in;\"\u003e• Image and analyse any kind of sample easily thanks to field-free optics and variable pressure operation.\u003c\/div\u003e\n\u003cdiv style=\"margin-left: .19in;\"\u003e• 6@6 : Observe 6 signals simultaneously, and EDS, at 6 mm working distance\u003c\/div\u003e\n\u003cdiv style=\"margin-left: .19in;\"\u003e \u003c\/div\u003e\n\u003ch3\u003eFlexible sample handling\u003c\/h3\u003e\n\u003cdiv style=\"margin-left: .19in;\"\u003e• Fast sample exchange through either the front door or exchange chamber \/ load lock\u003c\/div\u003e\n\u003cdiv style=\"margin-left: .19in;\"\u003e• Easily and safely navigate your sample using the integrated colour NaviCam\u003c\/div\u003e\n\u003cdiv style=\"margin-left: .19in;\"\u003e• Add in-situ substages for dynamic experiments\u003c\/div\u003e\n\u003cdiv style=\"margin-left: .19in;\"\u003e \u003c\/div\u003e\n\u003ch3\u003eClean and flexible vacuum system\u003c\/h3\u003e\n\u003cdiv style=\"margin-left: .19in;\"\u003e• Switch to variable pressure at any time with just a click\u003c\/div\u003e\n\u003cdiv style=\"margin-left: .19in;\"\u003e• No restriction in field of view or probe current when moving to variable pressure\u003c\/div\u003e\n\u003cdiv style=\"margin-left: .19in;\"\u003e• Keep both system and samples as clean as possible with the dry vacuum system or by adding a UV or plasma cleaner\u003c\/div\u003e\n\u003cdiv style=\"margin-left: .19in;\"\u003e \u003c\/div\u003e\n\u003ch3\u003eFuture proof\u003c\/h3\u003e\n\u003cdiv style=\"margin-left: .19in;\"\u003e• Made for fast and detailed analysis using single or multiple EDS detectors, EBSD and WDS\u003c\/div\u003e\n\u003cdiv style=\"margin-left: .19in;\"\u003e• Add CL for more information from minerals, photonics or pharmaceuticals\u003c\/div\u003e\n\u003cdiv style=\"margin-left: .19in;\"\u003e• Image hydrated or sensitive samples using cryo stage or Hitachi’s patented Ionic Liquid\u003c\/div\u003e\n\u003cdiv style=\"margin-left: .19in;\"\u003e• 21 accessory ports offers exceptional expandability\u003c\/div\u003e\n\u003cp align=\"center\"\u003e \u003c\/p\u003e\n\u003ch2\u003e \u003c\/h2\u003e\n\u003c\/div\u003e","brand":"Hitachi High-Tech","offers":[{"title":"Default Title","offer_id":42502665830640,"sku":"458-0071","price":1.0,"currency_code":"SEK","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0629\/5794\/5072\/products\/SU7000fotofromleftsquare.png?v=1648312287"},{"product_id":"im5000","title":"ArBlade5000 Ion Milling System","description":"\u003cp\u003eThe sophisticated IM5000Ar ion beam milling system from Hitachi can be used to prepare customized cross-sections measuring up to 10 mm wide. It also enhances pre-polished surfaces of samples that are often hard to prepare through conventional means (such as polishing, grinding and cutting).\u003c\/p\u003e\n\u003ch2\u003eProcessing Performance\u003c\/h2\u003e\n\u003cul\u003e\n\u003cli\u003eCustom width uniform cross-sections measuring up to 10 mm wide can be processed\u003c\/li\u003e\n\u003cli\u003eFinal polishing, for example, for EBSD, utilizing low angle milling (FlatMilling), or for contrasting by high angle milling (relief milling), in just a few minutes\u003c\/li\u003e\n\u003cli\u003eA single powerful ion beam gun allows high milling speed\u003c\/li\u003e\n\u003cli\u003eConstant ion beam emission from sub-1 kV accelerating voltage\u003c\/li\u003e\n\u003cli\u003eSupports fine-surface polishing of sensitive materials\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp align=\"center\"\u003e\u003cimg alt=\"The IM5000: An Advanced Ion Milling System\" src=\"https:\/\/d12oja0ew7x0i8.cloudfront.net\/images\/equipments\/EquipmentImage_7732_16130383009908670.png\" style=\"width: 417px; height: 268px;\" width=\"417\" height=\"268\"\u003e\u003c\/p\u003e\n\u003cp style=\"text-align: right;\"\u003e\u003cspan style=\"color: #4e5f70;\"\u003e\u003cem\u003eImage Credit: Hitachi High-Tech Europe\u003c\/em\u003e\u003c\/span\u003e\u003c\/p\u003e\n\u003ch2\u003eEasy Sample Handling\u003c\/h2\u003e\n\u003cul\u003e\n\u003cli\u003eMilling position can be readjusted at all times without remounting the specimen\u003c\/li\u003e\n\u003cli\u003eEx-situ alignment of mask and cross-sectioning range makes setup fast and easy\u003c\/li\u003e\n\u003cli\u003eResin-embedded samples of up to 25 mm in height and 50 mm in diameter can be loaded for ultimate polishing\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch2\u003eSimple Operation\u003c\/h2\u003e\n\u003cul\u003e\n\u003cli\u003eEasy maintenance and setup with a single ion beam gun\u003c\/li\u003e\n\u003cli\u003eSingle button push to initiate a process\u003c\/li\u003e\n\u003cli\u003eProgrammable multi-step processes\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch2\u003eExtendability\u003c\/h2\u003e\n\u003cul\u003e\n\u003cli\u003eCryo cooling allows cross-sections on heat sensitive materials\u003c\/li\u003e\n\u003cli\u003eMulti-position auto-processing, recipe management and workflow creation\u003c\/li\u003e\n\u003cli\u003eTreating oxidation sensitive sample (such as LiB electrodes) without making contact with air\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.hitachi-hightech.com\/global\/en\/products\/microscopes\/peripheral-equipment\/arblade5000.html\" title=\"Hitachi Arblade IM5000 Broad Ion Beam Milling System\" data-mce-fragment=\"1\" data-mce-href=\"https:\/\/www.alliedhightech.com\/equipment\/ad-5-fluid-dispenser\"\u003eLink to our supplier\u003c\/a\u003e\u003c\/p\u003e","brand":"Hitachi High-Tech","offers":[{"title":"Default Title","offer_id":42502666780912,"sku":"08E-0326","price":1.0,"currency_code":"SEK","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0629\/5794\/5072\/products\/IM5000withOM.jpg?v=1679346336"},{"product_id":"nx5000","title":"Ethos NX5000 FIB-SEM","description":"\u003cdiv class=\"TabContentsArea\"\u003e\n\u003ch2\u003e\u003cspan\u003eFeatures\u003c\/span\u003e\u003c\/h2\u003e\n\u003ch3\u003eKey Features\u003c\/h3\u003e\n\u003ch4\u003e1. High-Performance FE-SEM Column with Dual Lens Mode\u003c\/h4\u003e\n\u003cul class=\"ListStyle1\"\u003e\n\u003cli\u003eUltra-high-resolution observation (HR mode: semi-in-lens)\u003c\/li\u003e\n\u003cli\u003eHigh-accuracy end-point detection in real time (FF mode: Field Free (time sharing mode))\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch4\u003e2. High-Throughput Material Processing\u003c\/h4\u003e\n\u003cul class=\"ListStyle1\"\u003e\n\u003cli\u003eUltra-fast processing with high ion-current density (Max. beam current: 100 nA)\u003c\/li\u003e\n\u003cli\u003eUser programmable script for auto processing and observation\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch4\u003e3. Microsampling System\u003c\/h4\u003e\n\u003cul class=\"ListStyle1\"\u003e\n\u003cli\u003eFully integrated sample-orientation control for Anti-Curtaining Effect (ACE technology)\u003c\/li\u003e\n\u003cli\u003eTEM sample preparation for uniform lamellas at any orientation\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch4\u003e4. Triple-Beam Capable, Delivering Advanced Quality Results\u003c\/h4\u003e\n\u003cul class=\"ListStyle1\"\u003e\n\u003cli\u003eLow-acceleration noble-gas ion-beam material processing\u003c\/li\u003e\n\u003cli\u003eInnovative functions reduce Ga ion related and other milling artifacts\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch4\u003e5. Large Multi-Port Chamber and Stage for Various Applications\u003c\/h4\u003e\n\u003cul class=\"ListStyle1\"\u003e\n\u003cli\u003eLarge sample size capable system with exceptional stage stability\u003c\/li\u003e\n\u003cli\u003eFull range enhanced long-distance tracking (155 x 155mm)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch3\u003eRefined Electron Optics and Multi-Signal Detection\u003c\/h3\u003e\n\u003cp class=\"TextStyle1\"\u003eThe Ethos SEM column is composed of a magnetic- and electrostatic-field compound objective lens system configured as two lens modes. High Resolution (HR) mode achieves sample observation at ultimate resolution by immersing the sample within the magnetic field of the lens system. Field Free(FF) mode offers real-time FIB processing for high accuracy end point milling. Hyper switching between FIB irradiation and SEM imaging as fast as 10 nsec offers real-time fabrication and observation views with clarity. Fast SEM and IM imaging enables users to quickly find the area of interest with ease.\u003c\/p\u003e\n\u003cbr\u003e\n\u003c\/div\u003e","brand":"Hitachi High-Tech","offers":[{"title":"Default Title","offer_id":42502667600112,"sku":"BAC-0032","price":1.0,"currency_code":"SEK","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0629\/5794\/5072\/products\/NX5000_square.png?v=1648313244"},{"product_id":"nx2000","title":"NX2000 FIB-SEM for Wafers","description":"\u003cp\u003e\u003cstrong\u003eToward the ultimate TEM sample preparation system\u003c\/strong\u003e\u003cbr\u003e \u003cbr\u003eFIB-SEM systems have become an indispensable tool for characterization and analysis of the latest technologies and high performance nano-scale materials. An ever-increasing demand for ultrathin TEM lamellas without artifacts during FIB processing require the best in ion and electron optics technologies.\u003c\/p\u003e\n\u003cp\u003e\u003cbr\u003e Hitachi's NX2000 high performance FIB and high resolution SEM system with its unique sample orientation control* and triple beam* technologies, supports high throughput, and high quality TEM sample preparation for cutting edge applications.\u003c\/p\u003e\n\u003cp\u003e\u003cbr\u003e\u003csup\u003e*\u003c\/sup\u003e Option\u003c\/p\u003e","brand":"Hitachi High-Tech","offers":[{"title":"Default Title","offer_id":42502667731184,"sku":"BAA-0001","price":1.0,"currency_code":"SEK","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0629\/5794\/5072\/products\/NX2000_5b4ba5eb-302f-4422-a899-92596e97e095.jpg?v=1648313547"},{"product_id":"nanoprobing","title":"Nanoprobing","description":"\u003cp class=\"bodytext\" data-mce-fragment=\"1\"\u003eA simple task in the world of electronics is the measurement of an I-V curve of a single transistor. However, if the size of the transistor is reduced to a few tens of nanometres or less, this task becomes very challenging. Probing on small structures requires a nanoprober with high positioning accuracy and very stable positioners. Our nanoprobing solutions exceed the necessary requirements, providing you with a fast and simple system to effectively increase your probing throughput.\u003c\/p\u003e\n\u003cp class=\"bodytext\" data-mce-fragment=\"1\"\u003eHave a look at the examples below of failure analysis tasks that have been done recently using our products.\u003c\/p\u003e","brand":"Kleindiek","offers":[{"title":"Default Title","offer_id":42504775139568,"sku":"","price":1.0,"currency_code":"SEK","in_stock":false}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0629\/5794\/5072\/products\/web_10nm_2_1.jpg?v=1646571284"},{"product_id":"ebic-ebac","title":"EBIC\/EBAC","description":"\u003ch2 class=\"bodytext\" data-mce-fragment=\"1\"\u003eEBIC Characterization System for EBAC, RCI, EBIV, EBIRCH and EBIC measurements\u003c\/h2\u003e\n\u003cp class=\"bodytext\" data-mce-fragment=\"1\"\u003eWe have designed an easy-to-use EBIC and RCI nanoprobing analysis tool which is compatible with most commercially available SEM's and FIB's. Our system consists of two MM3A-EM micromanipulators, at least one of which is equipped with a low-current measurement kit (LCMK-EM) and a signal amplifier. The amplifier is connected to the video input of the microscope. The recorded signals are amplified and fed back to the microscope thus generating a greyscale map of current in the scanned area. This eliminates the need for additional scan generators and greatly enhances the system's ease-of-use. The acquired data can be overlayed with the imagery generated by the SEM's detectors.\u003c\/p\u003e\n\u003cp class=\"bodytext\" data-mce-fragment=\"1\"\u003ePrimary applications are open detection in integrated circuits, visualization of p-n junctions and localization of resistivity changes in via chains.\u003c\/p\u003e\n\u003cp class=\"bodytext\" data-mce-fragment=\"1\"\u003eThough mainly used for semiconductor failure analysis, this tool can be used for any application that requires accurate measurement of low currents. It can be quickly and easily added to your existing MM3A-EM micromanipulator system.\u003c\/p\u003e\n\u003cp class=\"bodytext\" data-mce-fragment=\"1\"\u003e\u003ca href=\"https:\/\/www.nanotechnik.com\/ps8.html\" title=\"Kleindiek Prober Shuttle\"\u003eLink to our supplier\u003c\/a\u003e\u003cbr\u003e\u003c\/p\u003e","brand":"Kleindiek","offers":[{"title":"Default Title","offer_id":42504778449136,"sku":"","price":1.0,"currency_code":"SEK","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0629\/5794\/5072\/products\/ebic_analog_2021_1.jpg?v=1646571523"},{"product_id":"e50","title":"E50 Plasma Cleaner","description":"\u003cdiv class=\"et_pb_column et_pb_column_1_2 et_pb_column_7  et_pb_css_mix_blend_mode_passthrough\" data-mce-fragment=\"1\"\u003e\n\u003cdiv class=\"et_pb_module et_pb_text et_pb_text_6  et_pb_text_align_left et_pb_bg_layout_light\" data-mce-fragment=\"1\"\u003e\n\u003cdiv class=\"et_pb_text_inner\" data-mce-fragment=\"1\"\u003e\n\u003cp data-mce-fragment=\"1\"\u003eThe \u003ca href=\"https:\/\/evactron.com\/evactron-e50\/\" data-mce-fragment=\"1\" title=\"Evactron E50\" data-mce-href=\"https:\/\/evactron.com\/evactron-e50\/\"\u003eEvactron® E50 Plasma De-Contaminator\u003c\/a\u003e is the most powerful model in the Evactron E-Series family of products. E50 plasma cleaner with external hollow cathode RF (XHCRF) plasma radical source (PRS) combines high performance cleaning with simplified design and simple operation.\u003c\/p\u003e\n\u003cp data-mce-fragment=\"1\"\u003eThe E50 system was designed to be user installed for removal of hydrocarbon contamination from high vacuum chambers such as SEMs, FIBs and large volume chambers. The Evactron E50 Plasma De-Contaminator fits most models of SEM and FIB systems with turbo pump evacuation systems. In operation it provides \u003cstrong data-mce-fragment=\"1\"\u003eThe Fastest Way to Pristine\u003c\/strong\u003e for SEM or FIB instruments.\u003c\/p\u003e\n\u003ch3 data-mce-fragment=\"1\"\u003eSystem Specifications\u003c\/h3\u003e\n\u003cul data-mce-fragment=\"1\"\u003e\n\u003cli data-mce-fragment=\"1\"\u003eDesktop controller with push-button operation\u003c\/li\u003e\n\u003cli data-mce-fragment=\"1\"\u003eAndroid tablet with Bluetooth communication or RS232 serial interface.\u003c\/li\u003e\n\u003cli data-mce-fragment=\"1\"\u003eSimple programing commands for OEM integration\u003c\/li\u003e\n\u003cli data-mce-fragment=\"1\"\u003ePRS with External RF hollow cathode plasma excitation.\u003c\/li\u003e\n\u003cli data-mce-fragment=\"1\"\u003eVacuum safety interlock and hardware interlock\u003c\/li\u003e\n\u003cli data-mce-fragment=\"1\"\u003eChassis dimensions: WxHxD:  2”x3.5”x8.6” (44×8.9x22cm)\u003c\/li\u003e\n\u003cli data-mce-fragment=\"1\"\u003eRF Power: 20-75 watts at 13.56 MHz XRFHC excited\u003c\/li\u003e\n\u003cli data-mce-fragment=\"1\"\u003e100-240 VAC 50\/60 Hz input\u003c\/li\u003e\n\u003cli data-mce-fragment=\"1\"\u003eCE\/TUV\/NRTL safety certified\u003c\/li\u003e\n\u003cli data-mce-fragment=\"1\"\u003eRoHS Compliant\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/evactron.com\/evactron-e50\/\" title=\"Evactron E50 Plasma Cleaner\"\u003eLink to our supplier\u003c\/a\u003e\u003c\/p\u003e\n\u003c\/div\u003e\n\u003c\/div\u003e\n\u003c\/div\u003e","brand":"XEI Evactron","offers":[{"title":"Default Title","offer_id":42504871117040,"sku":"","price":1.0,"currency_code":"SEK","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0629\/5794\/5072\/products\/E50white-600x300_1.jpg?v=1646575576"},{"product_id":"litescope","title":"LiteScope AFM-in-SEM","description":"\u003cp\u003e\u003cspan\u003eUnique Atomic Force Microscope LiteScope is designed to merge the \u003c\/span\u003e\u003ca href=\"https:\/\/www.nenovision.com\/technology\/correlative-microscopy\" target=\"_blank\" title=\"Correlative AFM and SEM\" rel=\"noopener noreferrer\"\u003estrengths of\u003cspan\u003e \u003c\/span\u003e\u003cspan\u003eAFM and SEM\u003c\/span\u003e\u003c\/a\u003e\u003cstrong\u003e\u003cspan\u003e \u003c\/span\u003e\u003c\/strong\u003e\u003cspan\u003etechniques, resulting in effective workflow and extending the possibilities of \u003c\/span\u003e\u003ca href=\"https:\/\/www.nenovision.com\/technology\/correlative-microscopy\" title=\"Correlative Electron Microscopy\"\u003ecorrelative microscopy\u003c\/a\u003e\u003cspan\u003e and \u003c\/span\u003e\u003cstrong\u003ein-situ analysis\u003c\/strong\u003e\u003cspan\u003e that ware difficult or almost impossible by conventional instrumentation.\u003c\/span\u003e\u003c\/p\u003e\n\u003cp\u003eAFM brings new in-situ SEM methods of characterization, enabling the analysis of a broad range of properties:\u003c\/p\u003e\n\u003cp\u003e\u003cstrong\u003eMaterial mechanical properties\u003c\/strong\u003e\u003c\/p\u003e\n\u003cul\u003e\n\u003cli\u003etopography\u003c\/li\u003e\n\u003cli\u003elocal elastic properties (tapping \u0026amp; contact mode)\u003c\/li\u003e\n\u003cli\u003elocal sample hardness (non-topographic)\u003c\/li\u003e\n\u003cli\u003edepth-dependent material characterization\u003c\/li\u003e\n\u003cli\u003evarious in-situ operations\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e\u003cstrong\u003eMaterial magnetic properties\u003c\/strong\u003e\u003c\/p\u003e\n\u003cul\u003e\n\u003cli\u003emagnetic domain imaging\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e\u003cstrong\u003eMaterial electro-mechanical properties\u003c\/strong\u003e\u003c\/p\u003e\n\u003cul\u003e\n\u003cli\u003epiezoelectric domain imaging\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e\u003cstrong\u003eMaterial electrical properties\u003c\/strong\u003e\u003c\/p\u003e\n\u003cul\u003e\n\u003cli\u003econductivity map (including insulated areas)\u003c\/li\u003e\n\u003cli\u003elocal surface potential\u003c\/li\u003e\n\u003cli\u003elocal electrical properties (non-topographic)\u003c\/li\u003e\n\u003cli\u003esub-nanometer topography\u003c\/li\u003e\n\u003c\/ul\u003e","brand":"Nenovision","offers":[{"title":"Default Title","offer_id":46486630629699,"sku":"","price":1.0,"currency_code":"SEK","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0629\/5794\/5072\/products\/product-cpem-litescope.png?v=1680770864"},{"product_id":"microprep™-pro","title":"microPREP™ PRO","description":"\u003cp\u003e\u003cspan data-mce-fragment=\"1\"\u003eThe microPREP PRO is your tool for laser-based sample preparation on a micron level. It enables laser-based sample preparation for a variety of specimen preparation applications. It complements existing approaches to sample preparation, such as ion beam processing.\u003c\/span\u003e\u003cbr data-mce-fragment=\"1\"\u003e\u003cspan data-mce-fragment=\"1\"\u003emicroPREP PRO can ablate metals, semiconductors, ceramics, polymers, and compound materials. It creates new vistas for material and process development and failure analysis.\u003c\/span\u003e\u003c\/p\u003e\n\u003cp\u003eThe main component of the microPREP PRO system is a laser source that enables high ablation rates with great accuracy. Different laser sources are available according to individual preparation needs.\u003c\/p\u003e\n\u003cp\u003emicroPREP PRO‘s excellent positioning system with piezo actuators and two cameras allows the user to bring specimens straightforwardly into the ultra-precise position for the desired preparation task. The integrated cleaning system prevents optical components from pollution, while the optional CO₂ Snow Jet removes debris from the sample surface within seconds.\u003c\/p\u003e\n\u003cp\u003eWith the microPREP PRO laser-based sample preparation system, your lab benefits from the following advantages:\u003c\/p\u003e\n\u003cul\u003e\n\u003cli\u003eFree-form sample preparation\u003c\/li\u003e\n\u003cli\u003eProvides samples with micron-level precision\u003c\/li\u003e\n\u003cli\u003eSophisticated workflows for automated tasks\u003c\/li\u003e\n\u003cli\u003eReduces time-to-sample significantly\u003c\/li\u003e\n\u003cli\u003eLower cost per sample\u003c\/li\u003e\n\u003c\/ul\u003e","brand":"3D-Micromac","offers":[{"title":"Default Title","offer_id":46955434443075,"sku":"","price":1.0,"currency_code":"SEK","in_stock":false}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0629\/5794\/5072\/files\/microPREP_PRO_front_view.jpg?v=1689503386"},{"product_id":"microprep-pro-femto","title":"microPREP™ PRO FEMTO","description":"\u003cp\u003eThe microPREP PRO FEMTO is your tool for laser-based sample preparation – especially when preparing atom-probe tips (APT) for further analysis.\u003c\/p\u003e\n\u003cp\u003eIts femtosecond laser source and optimized optical setup enable fast material removal with nanometer precision. microPREP PRO FEMTO can prepare APT microtip coupons directly from the sample material with automated workflows.\u003c\/p\u003e\n\u003cp\u003emicroPREP PRO can ablate metals, semiconductors, ceramics, polymers, and compound materials. It creates new vistas for material and process development and failure analysis.\u003c\/p\u003e\n\u003cp\u003eThe femtosecond laser source is the main component of the microPREP PRO FEMTO system. This ultrashort pulsed laser source and an optimized optical setup enable fast material removal with nanometer precision. microPREP PRO FEMTO’s excellent positioning system with piezo actuators and two cameras allows the user to bring specimens straightforwardly into the ultra-precise position for the desired preparation task.\u003cbr\u003emicroPREP PRO FEMTO can prepare APT microtip coupons directly from the sample material with automated workflows.\u003c\/p\u003e\n\u003cp\u003eWith the microPREP PRO FEMTO laser-based sample preparation system, your lab benefits from the following advantages:\u003c\/p\u003e\n\u003cul\u003e\n\u003cli\u003eFree-form sample preparation\u003c\/li\u003e\n\u003cli\u003ePreparation of APT microtip coupons directly from the sample\u003c\/li\u003e\n\u003cli\u003eSamples with micron-level precision\u003c\/li\u003e\n\u003cli\u003eSophisticated workflows for automated tasks\u003c\/li\u003e\n\u003cli\u003eReduced time-to-sample significantly\u003c\/li\u003e\n\u003cli\u003eLower cost per sample\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cul\u003e\u003c\/ul\u003e","brand":"3D-Micromac","offers":[{"title":"Default Title","offer_id":46955434541379,"sku":"","price":1.0,"currency_code":"SEK","in_stock":false}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0629\/5794\/5072\/files\/microPRO_PRO_FEMTO1_web.jpg?v=1689503468"},{"product_id":"su9600-fe-sem","title":"SU9600 FE-SEM","description":"\u003c!--\/Section--\u003e\n\u003cdiv class=\"show-print\" id=\"productSub-0\"\u003e\n\u003cdiv class=\"Section\"\u003e\n\u003cdiv class=\"TabContentsArea\"\u003e\n\u003ch1\u003eUltra-high Resolution Scanning Electron Microscope SU9600\u003c\/h1\u003e\n\u003ch2\u003e\u003cspan\u003eOverview\u003c\/span\u003e\u003c\/h2\u003e\n\u003cp class=\"TextStyle1\"\u003eThe SU9600 is HITACHI's new premium SEM. It features unique electron optics, with the sample positioned inside a gap between the upper and lower parts of the objective lens pole piece. This so-called true in-lens concept - combined with the next generation of HITACHI's cold field emission technology - guarantees the highest possible system resolution (SE resolution 0.4 nm @ 30 kV, 1 nm @ 1 kV without requiring beam deceleration technology [0.6nm with beam deceleration]) and stability.\u003c\/p\u003e\n\u003cul class=\"LinkListStyle1\"\u003e\n\u003cli\u003e\u003ca href=\"https:\/\/www.hitachi-hightech.com\/global\/science\/technical\/tech\/microscopes\/cold_fe\/\"\u003eNew coherent cold field emission source\u003c\/a\u003e\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cdiv class=\"Column1andHalf LastItem\"\u003e\n\u003cp class=\"TextStyle1\"\u003eThe Cold Field Emission source is ideal for high-resolution imaging with a small source size and energy spread. Innovative CFE Gun technology contributes the ultimate FE-SEM with superior beam brightness and stability, affording high-resolution imaging and high-quality elemental analysis. Unique object lens design has a capability of EELS and diffraction as well.\u003c\/p\u003e\n\u003cdiv class=\"Section\"\u003e\n\u003cul class=\"LinkListStyle1\"\u003e\n\u003cli class=\"NewWin\"\u003eTo learn more about the \u003cstrong\u003elow-voltage EELS and diffraction capabilities of the SU9000\u003c\/strong\u003e, refer to this article: “\u003ca href=\"http:\/\/journals.cambridge.org\/fulltext_content\/supplementary\/MAM22_S3_minisite\/7337\/0604.pdf\" target=\"_blank\"\u003eSTEM\/SEM, Chemical Analysis, Atomic Resolution and Surface Imaging at ≤ 30 kV with No Aberration Correction for Nanomaterials on Graphene Support\u003c\/a\u003e”.*\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003cdl class=\"AdditionalNotesStyle3 ClearFix\"\u003e\n\u003cdt\u003e*:\u003c\/dt\u003e\n\u003cdd\u003edoi:10.1017\/S1431927616003871, Microsc. Microanal. 22 (Suppl 3), 2016, © Microscopy Society of America 2016\u003c\/dd\u003e\n\u003c\/dl\u003e\n\u003c!--\/Section--\u003e\n\u003cdiv class=\"ClearFix\"\u003e\n\u003cdiv class=\"ImgRightAdjust\"\u003e\n\u003cp class=\"ImgOnlyStyle\"\u003e\u003cimg height=\"210\" width=\"300\" alt=\"Image quality evaluation resist\" src=\"https:\/\/www.hitachi-hightech.com\/image\/global\/science\/products\/microscopes\/electron-microscope\/fe-sem\/su9000_01.jpg\"\u003e\u003cbr\u003eSample : ArF Resist\u003cbr\u003eVacc : 500 V\u003cbr\u003eSignal : SE image\u003cbr\u003e\u003cstrong\u003eNo beam deceleration\u003c\/strong\u003e\u003c\/p\u003e\n\u003c\/div\u003e\n\u003c!--\/ImgRightAdjust--\u003e\n\u003cp class=\"TextStyle1\"\u003eTo make this resolving power usable in practical applications in your lab, the SU9600 utilizes an ultra-stable side-entry sample stage similar to high-end TEM systems and incorporates optimized vibration damping and a closed cabinet to shield the electron optics from environmental noise. Furthermore, the clean vacuum concept of the SU9600 offers a vacuum level in the gun and sample chamber that is one order of magnitude better than the previous generation, thereby minimizing sample contamination artifacts.\u003c\/p\u003e\n\u003cp class=\"TextStyle1\"\u003eIn addition to pure, unsurpassed resolution, the SU9600 is also equipped with a remarkable 2+2 detection system for sample surface, composition and transmission observations.\u003c\/p\u003e\n\u003c\/div\u003e\n\u003cp class=\"TextStyle1\"\u003eThe combined use of the patented Super ExB filter with the first upper detector allows users to filter and collect SE and LA-BSE signal energies of interest, thereby suppressing charging artifacts and showing topographical details, and the top detector selectively receives HA-BSE signals, providing topography-free information of material and crystallographical orientation differences. This signal selection technology makes the SU9600 a preferred system for catalyst and other areas of research as well as for biological and pharmaceutical immunolabeling applications when used in combination with a cryogenic sample holder.\u003c\/p\u003e\n\u003cp class=\"TextStyle1\"\u003eThe SU9600 is also an incredibly powerful low-kV STEM, often exhibiting higher contrast on critical sample features than high-energy S-TEM systems. In addition, simultaneous Brightfield and annular Darkfield imaging is possible with the Darkfield detector settable to 56 different positions for an optimized selection of Z-contrast of the pattern of interest.\u003c\/p\u003e\n\u003cp class=\"ImgOnlyStyle\"\u003e\u003cimg height=\"400\" width=\"600\" alt=\"S-5500 detect\" src=\"https:\/\/www.hitachi-hightech.com\/image\/global\/science\/products\/microscopes\/electron-microscope\/fe-sem\/su9000_02.jpg\"\u003e\u003c\/p\u003e\n\u003cp class=\"TextStyle1\"\u003eThe stunning stability of the SU9600 allows a guaranteed STEM resolution specification of 0.34 nm, enabling the observation of graphite lattice fringes for example in a carbon nanotube.\u003c\/p\u003e\n\u003cdiv class=\"ColumnSet\"\u003e\n\u003cdiv class=\"Column1andHalf FirstItem\"\u003e\n\u003cp class=\"ImgOnlyStyle\"\u003e\u003cimg height=\"189\" width=\"300\" alt=\"SU9000 CNT lattice fringes\" src=\"https:\/\/www.hitachi-hightech.com\/image\/global\/science\/products\/microscopes\/electron-microscope\/fe-sem\/su9000_03.jpg\"\u003e\u003cbr\u003eSample : Multi wall carbon nano tube (lattice fringes)\u003cbr\u003eVacc : 30 kV\u003cbr\u003eMag. : 2,000kx\u003cbr\u003eBright Field(BF)-STEM image\u003c\/p\u003e\n\u003c\/div\u003e\n\u003c!--\/Column1andHalf--\u003e\n\u003cdiv class=\"Column1andHalf LastItem\"\u003e\n\u003cp class=\"ImgOnlyStyle\"\u003e\u003cimg height=\"300\" width=\"300\" alt=\"Graphene\" src=\"https:\/\/www.hitachi-hightech.com\/image\/global\/science\/products\/microscopes\/electron-microscope\/fe-sem\/su9000_04.jpg\"\u003e\u003cbr\u003eSample : Graphene (lattice fringes)\u003cbr\u003eVacc : 30 kV\u003cbr\u003eMag. : 3,000kx\u003cbr\u003eBright Field(BF)-STEM image\u003c\/p\u003e\n\u003c\/div\u003e\n\u003c!--\/Column1andHalf--\u003e\n\u003c\/div\u003e\n\u003c!--\/ColumnSet--\u003e\n\u003cp\u003e \u003c\/p\u003e\n\u003c\/div\u003e\n\u003c!--\/TabContentsArea--\u003e\n\u003c\/div\u003e\n\u003c!--\/Section--\u003e\n\u003c\/div\u003e\n\u003c!--\/productSub--\u003e\n\u003cdiv class=\"show-print\" id=\"productSub-1\"\u003e\n\u003cdiv class=\"Section\"\u003e\n\u003cdiv class=\"TabContentsArea\"\u003e\n\u003ch2\u003e\u003cspan\u003eFeatures\u003c\/span\u003e\u003c\/h2\u003e\n\u003cul class=\"ListStyle1\"\u003e\n\u003cli\u003eThe world's highest SE resolution of 0.4 nm at 30 kV is guaranteed.\u003c\/li\u003e\n\u003cli\u003eUsable magnification of up to 3,000,000x.\u003c\/li\u003e\n\u003cli\u003eNewly designed CFE GUN provides high brightness and an extremely stable emission current.\u003c\/li\u003e\n\u003cli\u003eSuperior low kV performance for observing beam sensitive materials.\u003c\/li\u003e\n\u003cli\u003eNext generation Hitachi In-Lens SEM optics allows for routine observation at 1,000,000x.\u003c\/li\u003e\n\u003cli\u003eImproved vacuum technology that allows for UHV levels for reduced sample contamination.\u003c\/li\u003e\n\u003cli\u003eHighly engineered instrument enclosure featuring both superior strength and stability to allow for high resolution imaging in a broad range of environmental conditions.\u003c\/li\u003e\n\u003cli\u003eNewly designed objective lens enables high resolution imaging at a low acceleration voltage.\u003c\/li\u003e\n\u003cli\u003eSide entry sample exchange system increases throughput by reducing the time required to change samples and automatically positioning the sample at the current WD.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c!--\/TabContentsArea--\u003e\n\u003c\/div\u003e\n\u003c!--\/Section--\u003e\n\u003c\/div\u003e\n\u003c!--\/productSub--\u003e\n\u003cdiv class=\"show-print\" id=\"productSub-2\"\u003e\n\u003cdiv class=\"Section\"\u003e\n\u003cdiv class=\"TabContentsArea\"\u003e\n\u003ch2\u003e\u003cspan\u003eIn-lens SEM\u003c\/span\u003e\u003c\/h2\u003e\n\u003cp class=\"TextStyle1\"\u003eS-900 launched with 1,000 units installed. \u003cbr\u003eIn 1986, Hitachi released the S-900, the world's first commercial in-lens FE-SEM. With 0.8 nm SE resolution and a usable magnification of up to 800.000x, the new concept of the S-900 truly opened up a new world for researchers in many fields.\u003c\/p\u003e\n\u003cp class=\"ImgOnlyStyle CenterAdjust\"\u003e\u003cimg height=\"230\" width=\"250\" alt=\"S-900\" src=\"https:\/\/www.hitachi-hightech.com\/image\/global\/science\/products\/microscopes\/electron-microscope\/fe-sem\/su9000_05.jpg\"\u003e\u003c\/p\u003e\n\u003cp class=\"TextStyle1\"\u003eThe success story continued with the S-5000 (1990), S-5200 (2000) and S-5500 (2004), with each new model setting new standards.\u003c\/p\u003e\n\u003cp class=\"TextStyle1\"\u003eIn 2011 Hitachi celebrated 25 years of in-lens FE-SEM technology, and used that opportunity to introduce the new SU9600, the most powerful member in Hitachi's high-end FE-SEM product line-up.\u003c\/p\u003e\n\u003c\/div\u003e\n\u003c!--\/TabContentsArea--\u003e\n\u003c\/div\u003e\n\u003c!--\/Section--\u003e\n\u003c\/div\u003e\n\u003c!--\/productSub--\u003e\n\u003cdiv class=\"show-print\" id=\"productSub-3\"\u003e\n\u003cdiv class=\"Section\"\u003e\n\u003cdiv class=\"TabContentsArea\"\u003e\n\u003ch2\u003e\u003cspan\u003eLV-STEM\u003c\/span\u003e\u003c\/h2\u003e\n\u003ch3\u003eHigh-Resolution, Analytical STEM\/SEM Providing Simultaneous Chemical and Bonding Analysis, Atomic Resolution, and Surface Imaging at 30kV and below\u003c\/h3\u003e\n\u003cp class=\"TextStyle1\"\u003eInvestigating samples with the full capabilities of STEM at 30 keV and below is an extremely interesting and rapidly growing area of research: providing both Materials and Life Sciences with full SEM and STEM, inclusive EDX, and EELS capabilities, at low voltages. Less beam damage and higher contrast are the key arguments for the Low-Voltage STEM (LV-STEM), a capability that has been out of reach for researchers globally. With the LV-STEM, its low beam energy, increased contrast, and narrow energy spread, investigations of biological material in an unstained condition are becoming a reality for the first time.\u003c\/p\u003e\n\u003cp class=\"TextStyle1\"\u003eSince the STEM unit has no imaging lens after the sample, electrons that were inelastically scattered by the sample do not really worsen image quality (they do for TEM). The significance of the lack of chromatic aberrations after the sample increases with decreasing electron energy; samples that typically would require a 100-keV TEM, at the very least, can be investigated with low-keV STEM. Multi-scattering processes and absorption of course still appear—ultimately limiting the acceptable thickness of the specimen. However, the use of high-end specimen preparation techniques, or working with thin samples as is typical in nano-research fields, allows 30-keV STEMs to cover much of the areas of conventional higher-keV TEMs, while at the same time, providing surface information through standard SEM methods, including SE, BSE, and high-angle BSE.\u003c\/p\u003e\n\u003cp class=\"TextStyle1\"\u003eThe well-established cold FEG of Hitachi’s high-end SEMs is a tremendous benefit for EELS capabilities as well as the point resolution of STEM. Despite the unusually low voltage for EELS and the increased impact of environmental conditions on low-voltage electrons, we are able to demonstrate better than 400-meV FWHM (full width half maximum, see Figure 1, left) for the ZLP (zero loss peak) of EELS, allowing clear and crisp EELS data for fine structure investigations. For example, eliciting the tiny changes in the π bonding for the Graphene as layer after layer is added demonstrates the sensitivity of the LV-STEM (see Figure 1, right). The LV-STEM also has a 2\u003csup\u003end\u003c\/sup\u003e dedicated EELS detector with 3 elements, allowing the rapid (10,000 fps) acquisition of energy-filtered BF STEM images, Plasmon images, or the rapid collection of elemental maps. Switching between both detectors is easy and relies on Hitachi’s own unique design.\u003c\/p\u003e\n\u003cp class=\"TextStyle1\"\u003eThe LV-STEM feature (Figure 2) complements SE imaging and makes no compromise. Typical images taken at 30 keV without a Cs corrector or Cc corrector approach 0.2-nm resolution establishing the LV-STEM as the true performance leader for ≤ 30 keV microscopy. The importance of simultaneously acquiring STEM and SE data is demonstrated in Figure 3.\u003c\/p\u003e\n\u003cp class=\"TextStyle1\"\u003eAs this microscope can handle samples up to 5.0 mm × 9.5 mm × 3.5 mm, the optional windowless EDX detector supports the analysis of both thin and bulk areas. At an incredible collection angle of 0.7 sr, acquisition times for EDX maps are short (see details in Figure 4), making the LV-STEM a truly ground-breaking microscope for both Materials and Life Sciences applications.\u003c\/p\u003e\n\u003cdiv class=\"Section\"\u003e\n\u003cp class=\"TextStyle1\"\u003e\u003cstrong\u003eReferences\u003c\/strong\u003e\u003c\/p\u003e\n\u003cdl class=\"AdditionalNotesStyle2 ClearFix\"\u003e\n\u003cdt\u003e1)\u003c\/dt\u003e\n\u003cdd\u003eR.F. Egerton, “Electron Energy-Loss Spectroscopy in Electron Microscope”, Springer, New York\u003c\/dd\u003e\n\u003cdt\u003e2)\u003c\/dt\u003e\n\u003cdd\u003eK. Suenaga et al., Nature, Vol.468 (2010), 1088-1090\u003c\/dd\u003e\n\u003cdt\u003e3)\u003c\/dt\u003e\n\u003cdd\u003eG. Algara-Siller, O. Lehtinen, A. Turchanin and U. Kaiser, (2014). Appl. Phys. Lett., 104, 153115.\u003c\/dd\u003e\n\u003cdt\u003e4)\u003c\/dt\u003e\n\u003cdd\u003eThe authors wish to thank Dr. Tsuyohiko Fujigaya, Kyushu University for providing the samples.\u003c\/dd\u003e\n\u003c\/dl\u003e\n\u003c\/div\u003e\n\u003c!--\/Section--\u003e\n\u003cdiv class=\"Section\"\u003e\n\u003cdiv class=\"ColumnSet\"\u003e\n\u003cdiv class=\"Column2 FirstItem\"\u003e\n\u003cp class=\"ImgOnlyStyle\"\u003e\u003cimg height=\"210\" width=\"475\" alt=\"\" src=\"https:\/\/www.hitachi-hightech.com\/image\/global\/science\/products\/microscopes\/electron-microscope\/fe-sem\/su9000_vlstem01.png\"\u003e\u003cbr\u003e\u003cstrong\u003eFigure 1\u003c\/strong\u003e Left: despite the low (± 30 keV) energy of these electrons, the energy spread of the electron beam, measured by our own Hitachi EELS is 400 meV or less:. Right: EELS spectra differentiating between single , double and triple layers of graphene , graphite, diamond, and amorphous carbon.\u003c\/p\u003e\n\u003c\/div\u003e\n\u003c!--Column2--\u003e\n\u003cdiv class=\"Column1 LastItem\"\u003e\n\u003cp class=\"ImgOnlyStyle\"\u003e\u003cimg height=\"210\" width=\"210\" alt=\"\" src=\"https:\/\/www.hitachi-hightech.com\/image\/global\/science\/products\/microscopes\/electron-microscope\/fe-sem\/su9000_vlstem02.png\"\u003e\u003cbr\u003e\u003cstrong\u003eFigure 2\u003c\/strong\u003e The low-pass-filtered BF STEM of Graphene at 30 keV shows a resolution of close to 0.2 nm; the 0.142 nm atom distances are not resolved.\u003c\/p\u003e\n\u003c\/div\u003e\n\u003c!--\/Column1--\u003e\n\u003c\/div\u003e\n\u003c!--\/ColumnSet--\u003e\n\u003cdiv class=\"ColumnSet\"\u003e\n\u003cdiv class=\"Column2 FirstItem\"\u003e\n\u003cp class=\"ImgOnlyStyle\"\u003e\u003cimg height=\"165\" width=\"436\" alt=\"\" src=\"https:\/\/www.hitachi-hightech.com\/image\/global\/science\/products\/microscopes\/electron-microscope\/fe-sem\/su9000_vlstem03.png\"\u003e\u003cbr\u003e\u003cstrong\u003eFigure 3\u003c\/strong\u003e Left: The high-resolution 30-keV BF STEM image by itself makes it difficult to model its 3D structure. Right: Only in combination with the (simultaneously acquired) high-resolution SE image, the real structure of this sample becomes obvious and modeling this structure as a 3D model would be quite manageable.\u003c\/p\u003e\n\u003c\/div\u003e\n\u003c!--Column2--\u003e\n\u003cdiv class=\"Column1 LastItem\"\u003e\n\u003cp class=\"ImgOnlyStyle\"\u003e\u003cimg height=\"160\" width=\"230\" alt=\"\" src=\"https:\/\/www.hitachi-hightech.com\/image\/global\/science\/products\/microscopes\/electron-microscope\/fe-sem\/su9000_vlstem04.png\"\u003e\u003cbr\u003e\u003cstrong\u003eFigure 4\u003c\/strong\u003e Elemental EDX map (Au M) at 30 kV, The size of the nano-particles is in the range of 5-10 nm. Acquisition time is 3.5 min at a current of 1 nA\u003c\/p\u003e\n\u003c\/div\u003e\n\u003c!--\/Column1--\u003e\n\u003c\/div\u003e\n\u003c!--\/ColumnSet--\u003e\n\u003c\/div\u003e\n\u003c!--\/Section--\u003e\n\u003cul class=\"LinkListStyle1\"\u003e\n\u003cli class=\"Pdf\"\u003e\u003ca href=\"https:\/\/www.hitachi-hightech.com\/file\/global\/pdf\/science\/products\/microscopes\/electron-microscope\/fe-sem\/em-su9000_vlstem01.pdf\"\u003eHigh-Resolution, Analytical STEM\/SEM Providing Simultaneous Chemical and Bonding Analysis, Atomic Resolution, and Surface Imaging at 30 kV and below (PDF format, 403kBytes)\u003c\/a\u003e\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/div\u003e\n\u003c\/div\u003e\n\u003c\/div\u003e","brand":"Hitachi High-Tech","offers":[{"title":"Default Title","offer_id":54526103159107,"sku":null,"price":1.0,"currency_code":"SEK","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0629\/5794\/5072\/files\/SU9600_press_release.jpg?v=1780580553"}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0629\/5794\/5072\/collections\/Wafer_square_57a4dfd1-335e-444f-98c3-a83abaf78b45.jpg?v=1780579997","url":"https:\/\/spectral.se\/collections\/semiconductors-copy-1.oembed","provider":"Spectral AB","version":"1.0","type":"link"}